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Brand New 2300°C Omni R&D Vacuum Deposition Furnace

OMNI R&D

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SKU:
ORD-VDF
Condition:
New

Product Overview

The Omni R&D Vacuum Deposition Furnace is a specialized high-temperature processing system designed for advanced materials preparation, particularly carbon-carbon composite materials. This sophisticated equipment excels in the preparation of pyrolytic carbon coatings on various substrates, making it essential for cutting-edge applications in semiconductor manufacturing, aerospace materials, and high-performance composite production.

Primary Applications:

Advanced Materials Processing

  • Carbon-Carbon Composite Materials: Preparation and processing of advanced composite structures
  • Pyrolytic Carbon Coating: Precision deposition of pyrolytic carbon layers on various substrates
  • Graphite Processing: Surface treatment and modification of graphite materials
  • Semiconductor Device Manufacturing: Critical processing steps for semiconductor components
  • Heat-Resistant Scour Materials: Development and processing of high-temperature resistant materials

Scope of Application

Target Materials

  • Graphite and graphite-based materials
  • Semiconductor devices and components
  • Heat-resistant scour materials
  • Carbon fiber reinforced composites
  • Advanced ceramic materials

Technical Specifications:

Operating Parameters

  • Design Temperature Range: 1250°C / 1650°C / 1800°C / 2200°C (customizable)
  • Common Operating Temperature: 900°C - 1200°C
  • Maximum Temperature Capability: Up to 2300°C
  • Vacuum Degree: < 50Pa (operating) / 1-100Pa (limit vacuum degree)
  • Pressure Rise Rate: 6.67 Pa/h (or 150Pa/24h) in cold state of empty furnace: 0.67 Pa/h (operational)

Heating Systems:

  • Heating Methods: Graphite resistance heating or induction heating options
  • Temperature Control: Independent temperature control with excellent uniformity
  • Power Supply Options: KGPS/IGBT (specifically optimized for medium frequency heating applications)

Atmosphere Control:

  • Available Atmospheres: Vacuum / CH₄ / C₃H₆ / H₂ / N₂ / Ar
  • Gas Control: Mass flow meter control with multi-channel gas path system
  • Flow Characteristics: Uniform flow field design eliminates deposition dead angles
  • Deposition Quality: Optimized for superior deposition effects

Environmental Features:

  • Exhaust System: Multi-stage and efficient exhaust treatment system
  • Environmental Compliance: Environmentally friendly with easy cleanup procedures
  • Pollution Control: Strong anti-pollution capabilities with fully enclosed deposition chamber

Structural Configurations:

Furnace Design Options:

  • Geometry: Square, round, vertical, or horizontal structures
  • Custom Design: Non-standard designs available for specific applications
  • Chamber Design: Fully enclosed deposition chamber with excellent sealing effectiveness

Structural Variations:

  • Horizontal Configuration: Side discharge design
  • Vertical Configuration: Up/down discharge options
  • Door Systems: Manual or automatic furnace door locking mechanisms

Materials and Components:

  • Furnace Shell: Inner stainless steel or all stainless steel construction
  • Insulation Materials: Carbon felt, graphite felt, or carbon fiber cured felt options
  • Heater/Muffle Materials: Graphite or CFC (Carbon Fiber Composite) construction
  • Temperature Measurement: Single colorimetric or double colorimetric infrared instrumentation

Cooling Systems:

  • Standard Cooling: Furnace shell water cooling
  • Enhanced Cooling: Optional external circulation quick cooling system
  • Performance Benefits: Short cooling times with high production efficiency

Available Models:

Model

Working Zone Size Φ×H (mm)

Highest Temperature (°C)

Temperature Uniformity (°C)

Heating Method

ORD-0305-C

300×500

2300

±5

Resistance/Induction

ORD-0505-C

500×500

2300

±5

Resistance/Induction

ORD-0608-C

600×800

2300

±5/±7.5

Resistance/Induction

ORD-0612-C

600×1200

2300

±7.5/±10

Resistance/Induction

ORD-0812-C

800×1200

2300

±7.5/±10

Resistance/Induction

ORD-1120-C

1100×2000

2300

±10/±15

Resistance/Induction

ORD-1218-C

1200×1800

2300

±10/±15

Resistance/Induction

ORD-1520-C

1500×2000

2300

±15/±20

Resistance/Induction

All models maintain limit vacuum degree of 1-100 Pa and pressure rise rate of 0.67 Pa/h

Key Advantages

Superior Process Control

  • Uniform Deposition: Advanced gas flow design eliminates dead angles for consistent coating quality
  • Precise Temperature Management: Independent temperature control ensures optimal processing conditions
  • Flexible Atmosphere Control: Multiple gas options provide versatility for various deposition processes

Advanced Engineering

  • Excellent Sealing: Fully enclosed chamber design provides superior vacuum integrity
  • Efficient Cooling: Optional quick cooling systems maximize production throughput
  • Robust Construction: High-quality materials ensure long-term reliability and performance

Environmental Responsibility

  • Clean Operation: Multi-stage exhaust treatment ensures environmental compliance
  • Easy Maintenance: User-friendly design facilitates routine cleaning and maintenance
  • Pollution Prevention: Strong anti-pollution capabilities protect both process and environment

Process Capabilities

Deposition Technology

  • Pyrolytic Carbon Coating: Precision deposition for enhanced material properties
  • Uniform Coverage: Advanced gas flow management ensures consistent coating thickness
  • Quality Assurance: Superior temperature uniformity maintains process repeatability

Material Enhancement

  • Surface Modification: Transforms material surface properties for specialized applications
  • Composite Preparation: Essential for advanced carbon-carbon composite manufacturing
  • High-Temperature Processing: Capable of extreme temperature operations up to 2300°C

Industries Served

Aerospace and Defense

  • Carbon-carbon composite components for aerospace applications
  • High-temperature resistant materials for extreme environments
  • Advanced coating applications for aerospace components

Semiconductor Industry

  • Semiconductor device processing and coating
  • Electronic component surface modification
  • Precision materials for semiconductor manufacturing

Advanced Materials Research

  • Research and development of new composite materials
  • Material property enhancement and modification
  • Prototype development for advanced applications

Industrial Applications

  • Heat-resistant component manufacturing
  • Specialized coating applications
  • High-performance material production

Quality Assurance

Process Consistency

  • Excellent temperature uniformity across all working zones
  • Precise vacuum control for repeatable results
  • Advanced monitoring systems ensure process integrity

Material Protection

  • Controlled atmosphere prevents contamination
  • Superior sealing protects against external influences
  • Clean processing environment maintains material purity

Why Choose ORD Vacuum Deposition Furnace

This advanced vacuum deposition system represents the pinnacle of materials processing technology for carbon-carbon composites and specialized coatings. The combination of precise temperature control, superior vacuum capabilities, and flexible atmosphere management makes this equipment essential for organizations developing or producing advanced materials.

The extensive model range accommodates applications from small-scale research to large-scale production, while the dual heating options (resistance and induction) provide flexibility for various processing requirements. The environmental-friendly design and efficient operation make this system an ideal investment for facilities committed to both performance excellence and environmental responsibility.

Whether for cutting-edge aerospace applications, semiconductor manufacturing, or advanced materials research, the ORD Vacuum Deposition Furnace delivers the precision, reliability, and performance required for success in today's demanding materials technology landscape.

Warranty Information

One Year Parts Warranty

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