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Nano-CVD-PECVD Systems

Nano-CVD-PECVD Systems

Nano-CVD and PECVD Systems at Omni R&D

Our advanced nano-deposition systems deliver precision control for cutting-edge materials development. From research laboratories to industrial applications, these systems enable the controlled growth and deposition of advanced materials including graphene, carbon nanotubes, and innovative thin films.

Core Technology Systems:

Advanced CVD Solutions

  • CVD Furnaces: Specialized systems for controlled vapor deposition
  • MPCVD Furnaces: Microwave plasma-enhanced deposition technology
  • PECVD Furnaces: Plasma-enhanced systems for low-temperature processing
  • Fluidized Bed Reactors: Advanced gas-solid reaction systems
  • Nanomaterial Systems: Dedicated platforms for nanoscale material synthesis

Technical Specifications Our systems feature:

  • Temperature control from ambient to 1200°C+
  • Multi-zone programmable heating
  • High-purity alumina ceramic fiber chambers
  • Precision mass flow controllers
  • Ultra-high vacuum capabilities (below 10^-5 Pa)
  • Advanced PID temperature control
  • Intuitive touchscreen interfaces
  • Automated process management
  • RF plasma power integration for PECVD
  • Scalable configurations from R&D to production

Application Areas Engineered for development in:

  • High-quality graphene synthesis
  • Carbon nanotube fabrication
  • Transparent conductor development
  • Semiconductor material processing
  • Advanced thin film deposition
  • Emerging nanotechnology research

Our systems support diverse applications across electronics, energy storage, biotechnology, and advanced materials research. Each configuration can be optimized for specific research requirements or scaled for industrial production.

Contact our technical team to discuss your specific application needs and system requirements.

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