Nano-CVD-PECVD Systems

Omni R&D offers advanced nano CVD and PECVD systems for the controlled growth and deposition of graphene, carbon nanotubes, transparent conductors, and other innovative nanomaterials. These state-of-the-art vacuum furnaces provide precise temperature control from ambient to over 1200°C with programmable multi-zone heating for optimized thin film fabrication.

The nano CVD reactors utilize high-purity alumina ceramic fiber chambers with resistance wire heating elements for excellent temperature uniformity and rapid ramp rates. Integrated mass flow controllers enable accurate gas handling, while turbomolecular pumps achieve ultra-high vacuum levels below 10^-5 Pa. Modular designs allow scalability from R&D pilot systems to industrial-scale production models.

Key features include programmable PID temperature controllers, touch screen HMIs for automated process control, and specialized capabilities like RF plasma power supplies for PECVD. These cutting-edge nano deposition tools support the development of high-quality graphene films, carbon nanotube growth, transparent conductors for displays/sensors, semiconductor materials, and other emerging nanotechnologies.

Whether for academic research or commercial product development in fields like electronics, energy, and biotechnology, Omni R&D's Nano CVD and PECVD Systems provide the precision and flexibility required to push the boundaries of materials innovation.